Nonlinear Model Reduction for RTCVD

In this paper, we examine alternative methods for reducing the dimensionality of nonlinear dynamical system models arising in control of rapid thermal chemical vapor deposition (RTCVD) for semiconductor manufacturing. We focus on model reduction for the ordinary differential equation model describing heat transfer to, from, and within a semiconductor wafer in the RTCVD chamber. Two model reduction approaches are studied and compared: the proper orthogonal decomposition and the method of balancing. This leads to a discussion of computational issues in the practical implementation of balancing for nonlinear systems.